Manual Wet Benches for Cleaning and Etching
Flexible wet processing solutions for research, pilot lines and production.
Manual wet bench in operation
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Investment tailored to your needs
Process tanks and equipment matched to your needs.
Cleaning and rinsing
Chemical handling and rinsing tailored to the process.
Custom tank configurations
Tanks, heating and controls can be flexibly combined.
Versatile wet processes
Cleaning, etching and developing depending on configuration.
Operator safety
Exhaust and monitoring matched to the chemical application.
Manual Wet Benches – Flexible Configurations
Manual wet benches support repeatable wet processes with maximum flexibility. Depending on the application, process tanks, heating, ultrasonics, rinsing, exhaust and controls can be combined.
Explore the qLAB manual wet bench
For Wafers, Substrates and Components
One system – many possibilities.
Suitable for different substrates depending on process, geometry and chemistry.
Explore materials & substrates
Related Products & Systems
Complementary solutions for your wet process.
Typical Applications
From research and development to industrial manufacturing.
Wafer cleaning
Cleaning silicon and compound semiconductor wafers.
Chemical etching
Selective chemical surface treatment.
Developing
Chemical developing processes for substrates.
Substrate preparation
Preparation before downstream process steps.
Research and development
Trials and small production batches.
Frequently asked questions
How is a manual wet bench configured?
Process sequence, substrate format and chemicals determine the tank arrangement, material and equipment.
Which control options are available?
Depending on the application, controls range from individual buttons to an interface with recipe management.
Let’s discuss your manual wet bench
We configure process tanks, controls and utility connections around your workflow.