Marangoni dryer with hot N₂
Configuration with heated nitrogen. Process parameters are matched to the substrate and rinse process.
WAFER & SUBSTRATE DRYING
Drying Systems for Wafers and Substrates
Controlled drying as a critical step after wet cleaning.
Drying tailored to your needs
Method and equipment size matched to production needs.
Removing residual liquids
Drying tailored to the surface and substrate material.
Process line integration
Handling and interfaces matched to the wet process.
Defined process conditions
Drying parameters matched to process requirements.
Gentle substrate processing
Support and processing take sensitive substrates into account.
EQUIPMENT OVERVIEW
Drying After Wet Processing
Drying after wet processing is critical for surface quality. The appropriate method depends on substrate, residual liquid, throughput and cleanliness requirements.
Explore the qSPRINT process platform
For Wafers, Substrates and Components
One system – many possibilities.
Drying processes tailored to surfaces, substrate materials and handling.
Explore materials & substratesRelated Products & Systems
Complementary solutions for your wet process.
Typical Applications
From research and development to industrial manufacturing.
Post-clean wafer drying
Drying after cleaning and rinsing.
Semiconductor processes
Drying processes for semiconductor wafers.
Substrate drying
Removal of residual liquids from substrates.
Research
Process development and validation.
Pilot and volume production
Integration into production workflows.
Drying methods at a glance
Lift-out Marangoni dryer
Substrates are lifted from the rinse bath at a controlled rate. The Marangoni effect helps remove the liquid film.
Hot-air dryer
Temperature and airflow are configured for the load and substrate geometry.
Vacuum dryer
Drying takes place at reduced pressure. Pressure, temperature and cycle are configured for the application.
All variants can be built as standalone units. Their design draws on exateq’s experience integrating drying modules into automatic wet benches.
Frequently asked questions
Which drying methods does exateq offer?
Options include Marangoni drying with hot N₂ or lift-out from the rinse bath, as well as hot-air and vacuum drying.
Are the dryers available as standalone units?
Yes, all variants can be configured as standalone units.
PERSONAL CONSULTATION
Let’s discuss your drying process
We help you select a drying method for your substrates and process sequence.