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Automatic wet bench with control monitor
AUTOMATED WET PROCESSING

Automated Wet Benches for Industrial Wet Processing

Automated cleaning, etching and process control for demanding throughput and repeatability requirements.

Automatic wet bench in operation

Efficient processing

Automation matched to throughput and production needs.

Controlled chemical handling

Chemical supply and rinsing tailored to the process.

Automated handling

Substrate transport and workflows integrated into one system.

Repeatable wet processes

Process steps and parameters configurable through recipes.

Monitored processing

Monitoring and protection functions based on the system concept.

EQUIPMENT OVERVIEW

Custom Automated Wet Processing

Automated wet benches integrate multiple process steps into one system. Tanks, transport automation, recipe management and interfaces are adapted to the substrate and manufacturing requirements.

Automatic wet bench with control monitor
Custom design for process requirements
Materials selected for chemical compatibility
Configurable process and operating functions
Exhaust and safety requirements considered
Integration into existing workflows
Optional automation and monitoring
Project-specific engineering and implementation

Automatic wet benches compared

Which wet bench fits your application? qSPRINT offers flexible process sequences in a compact footprint, qRUN supports different batch sizes for solar cell manufacturing, and qMARATHON is designed for large-format substrates.

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FeatureqSPRINTqRUNqMARATHON
Main applicationSemiconductor and other applications requiring a range of wet chemical processesWafer cleaning and texturing for solar cell manufacturingWet chemical processing of large-format IC substrates, printed circuit boards and glass
Format and batch sizeWafer format and batch size depend on equipment configuration50, 100, 200, 400 or 600 full-square wafers per batch, depending on configurationSubstrates up to 600 × 600 mm
Typical useProcess development and productionPilot to mass productionContinuous industrial operation
Equipment designCompact design with one or two rows of process tanksModular system with dynamic carrier buffering and software-based batch schedulingModular material flow with optional belt loading and maintenance access via walkways

Equipment is configured to suit the substrate format, process sequence and target throughput.

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For Wafers, Substrates and Components

One system – many possibilities.

Automated processing for different wafer and substrate formats.

Explore materials & substrates

Related Products & Systems

Complementary solutions for your wet process.

Typical Applications

From research and development to industrial manufacturing.

Semiconductor Industry Icon

Semiconductor manufacturing

Wet processing in wafer manufacturing.

Photovoltaics Icon

Photovoltaics

Cleaning and texturing solar wafers.

Integrated Circuits Icon

IC substrates

Processing large-format substrates.

Surface Treatment Icon

Surface treatment

Cleaning and etching technical surfaces.

Series Production Icon

Volume production

Automated workflows in manufacturing.

Historic exateq wet bench for photovoltaic production in Taiwan, 2015
Project report · Taiwan 2015

International from the start – the first exateq wet benches went to Taiwan in 2015

Two automatic wet benches for solar wafer texturing. The report covers the role of KOH and texturing additives and what exateq learned during commissioning on site.

Read the project report →

Frequently asked questions

What information is needed for initial design?

Substrate format, process sequence, batch size and target throughput guide platform selection and system layout.

How is the wet bench integrated into production?

We match loading and unloading, utility connections and control interfaces to material flow and existing infrastructure.

PERSONAL CONSULTATION

Let’s discuss your automatic wet bench

We plan process sequences, handling and throughput for your production line.